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Comparison of oxide planarization pattern dependencies between two different CMP tools using statistical metrology (1996)

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by R. R. Divecha , B. E. Stine , D. O. Ouma , D. S. Boning , J. E. Chung , O. S. Nakagawa , S-y. Oh , D. L. Hetherington
Venue:VLSI Multilevel Interconnect Conference
Citations:2 - 1 self