An Overview of Level Set Methods for Etching, Deposition, and Lithography Development (1996)
| Venue: | IEEE Transactions on Semiconductor Devices |
| Citations: | 17 - 1 self |
BibTeX
@ARTICLE{Sethian96anoverview,
author = {J. A. Sethian and D. Adalsteinsson},
title = {An Overview of Level Set Methods for Etching, Deposition, and Lithography Development},
journal = {IEEE Transactions on Semiconductor Devices},
year = {1996},
volume = {10},
pages = {167--184}
}
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Abstract
The range of surface evolution problems in etching, deposition, and lithography development oers signicant challenge for numerical methods in front tracking. Level set methods for evolving interfaces are specically designed for proles which can develop sharp corners, change topology, and undergo orders of magnitude changes in speed. They are based on solving a Hamilton-Jacobi type equation for a level set function, using techniques borrowed from hyperbolic conservation laws. Over the past few years, a body of level set methods have been developed with application to microfabrication problems. In this paper, we give an overview of these techniques, describe the implementation in etching, deposition, and lithography simulations, and present a collection of fast level set methods, each aimed at a particular application. In the case of photoresist development and isotropic etching/deposition, the fast marching level set method, introduced by Sethian in [40, 39], can track the three-dim...
