informs ® doi 10.1287/opre.1050.0254 © 2005 INFORMS This paper concerns a method for digital circuit optimization based on formulating the problem as a geometric program (GP) or generalized geometric program (GGP), which can be transformed to a convex optimization problem and then very efficiently solved. We start with a basic gate scaling problem, with delay modeled as a simple resistor-capacitor (RC) time constant, and then add various layers of complexity and modeling accuracy, such as accounting for differing signal fall and rise times, and the effects of signal transition times. We then consider more complex formulations such as robust design over corners, multimode design, statistical design, and problems in which threshold and power supply voltage are also variables to be chosen. Finally, we look at the detailed design of gates and interconnect wires, again using a formulation that is compatible with GP or GGP.

In this paper we give a brief overview of a heuristic method for approximately solving a statistical digital circuit sizing problem, by reducing it to a related deterministic sizing problem that includes extra margins in each of the gate delays to account for the variation. Since the method is based on solving a deterministic sizing problem, it readily handles large-scale problems. Numerical experiments show that the resulting designs are often substantially better than one in which the variation in delay is ignored, and often quite close to the global optimum. Moreover, the designs seem to be good despite the simplicity of the statistical model (which ignores gate distribution shape, correlations, and so on). We illustrate the method on a 32-bit Ladner-Fischer adder, with a simple resistor-capacitor (RC) delay model, and a Pelgrom model of delay variation.

As IC technologies scale to finer feature sizes, it becomes increasingly difficult to control the relative process variations. The increasing fluctuations in manufacturing processes have introduced unavoidable and significant uncertainty in circuit performance; hence ensuring manufacturability has been identified as one of the top priorities of today’s IC design problems. In this paper, we review various statistical methodologies that have been recently developed to model, analyze, and optimize performance variations at both transistor level and system level. The following topics will be discussed in detail: sources of process variations, variation characterization and modeling, Monte Carlo analysis, response surface modeling, statistical timing and leakage analysis, probability distribution extraction, parametric yield estimation and robust IC optimization. These techniques provide the necessary CAD infrastructure that facilitates the bold move from deterministic, corner-based IC design toward statistical and probabilistic design. 1