This paper presents a comprehensive survey of existing techniques for interconnect optimization during the VLSI physical design process, with emphasis on recent studies on interconnect design and optimization for high-performance VLSI circuit design under the deep submicron fabrication technologies. First, we present a number of interconnect delay models and driver/gate delay models of various degrees of accuracy and efficiency which are most useful to guide the circuit design and interconnect optimization process. Then, we classify the existing work on optimization of VLSI interconnect into the following three categories and discuss the results in each category in detail: (i) topology optimization for highperformance interconnects, including the algorithms for total wire length minimization, critical path length minimization, and delay minimization; (ii) device and interconnect sizing, including techniques for efficient driver, gate, and transistor sizing, optimal wire sizing, and simultaneous topology construction, buffer insertion, buffer and wire sizing; (iii) highperfbrmance clock routing, including abstract clock net topology generation and embedding, planar clock routing, buffer and wire sizing for clock nets, non-tree clock routing, and clock schedule optimization. For each method, we discuss its effectiveness, its advantages and limitations, as well as its computational efficiency. We group the related techniques according to either their optimization techniques or optimization objectives so that the reader can easily compare the quality and efficiency of different solutions.

Interconnect has become the dominating factor in determining circuit performance and reliability in deep submicron designs. In this embedded tutorial, we first discuss the trends and challenges of interconnect design as the technology feature size rapidly decreases towards below 0.1 micron. Then, we present commonly used interconnect models and a set of interconnect design and optimization techniques for improving interconnect performance and reliability. Finally, we present comparisons of different optimization techniques in terms of their efficiency and optimization results, and show the impact of these optimization techniques on interconnect performance in each technology generation from the 0.35µm to 0.07µm projected in the National Technology Roadmap for Semiconductors.

This paper presents an overview of recent advances on modeling and layout optimization of devices and interconnects for high-performance VLSI circuit design under the deep submicron technology. First, we review a number of interconnect and driver/gate delay models, which are most useful to guide the layout optimization. Then, we summarize the available performance optimization techniques for VLSI device and interconnect layout, including driver and transistor sizing, transistor ordering, interconnecttopology optimization, optimal wire sizing, optimal buffer placement, and simultaneous topology construction, buffer insertion, buffer and wire sizing. The efficiency and impact of these techniques will be discussed in the tutorial.