This paper analyzes the limitations of the existing interconnect technologies and design methodologies and presents a novel three-dimensional (3-D) chip design strategy that exploits the vertical dimension to alleviate the interconnect related problems and to facilitate heterogeneous integration of technologies to realize a system-on-a-chip (SoC) design. A comprehensive analytical treatment of these 3-D ICs has been presented and it has been shown that by simply dividing a planar chip into separate blocks, each occupying a separate physical level interconnected by short and vertical interlayer interconnects (VILICs), significant improvement in performance and reduction in wire-limited chip area can be achieved, without the aid of any other circuit or design innovations. A scheme to optimize the interconnect distribution among different interconnect tiers is presented and the effect of transferring the repeaters to upper Si layers has been quantified in this analysis for a two-layer 3-D

integration density and lower interconnection complexity and delay. At present, however, not much work on circuit applications has been done due to lack of insight into 3-D circuit architecture and performance. One of the purposes of realizing 3-D integration is to reduce the interconnect complexity and delay of two dimensions (2-D), which are widely considered as the barriers to continued performance gains in future technology generations. Thus, understanding the interconnect and its related issues, such as the impact on circuit performance, is key to 3-D circuit applications. In this paper, we present a stochastic 3-D interconnect model and study the impact of 3-D integration on circuit performance and power consumption. To model 3-D interconnect, we divide 3-D wires into two parts (horizontal wires and vertical wires) and derive their stochastic distributions. Based on those distributions, we estimate the delay distribution. We show that 3-D structures effectively reduce the number of long delay nets, significantly reduce the number of repeaters, and dramatically improve circuit performance. With 3-D integration, circuits can be clocked at frequencies much higher (double or even triple) than 2-D. Index Terms—Interconnect modeling, performance characterization, power consumption, repeaters, technology generations, three-dimensional circuits, technology planning. I.

3-D technology promises higher integration density and lower interconnection complexity and delay. At present, however, not much work on circuit applications has been done due to lack of insight into 3-D circuit architecture and performance. In this paper, we investigate the interconnect distributions of 3-D circuits. We divide the 3-D interconnects into horizontal wires and vertical wires and derive their wire-length distributions, respectively. Based on the stochastic wire-length distributions, we calculate 3-D circuit interconnect delay distribution. We show that 3-D structures effectively reduce the number of long delay nets, significantly reduce the number of repeaters needed, and dramatically improve the performance. With 3-D structures, a circuit can work at a much higher clock rate (double, even triple) than with 2-D. However, we also show that the impacts of vertical wires on chip area and interconnect delay may limit the number of device layers that we can integrate. 1.

Continuous scaling of VLSI circuits is reducing gate delays but rapidly increasing interconnect delays. Semiconductor industry roadmap predicts, that beyond the 130 nm technology node, performance improvement of advanced VLSI is likely to begin to saturate unless a paradigm shift from present IC architecture is introduced. This paper presents a comprehensive analytical treatment of ICs with multiple Si layers (3-D ICs). It is shown that significant improvement in performance (more than 145%) and reduction in wire-limited chip area can be achieved with 3-D ICs with vertical inter-layer interconnects. This analysis is based on dividing a chip into separate blocks, each occupying a physical level. A scheme to optimize interconnect distribution among different interconnect tiers is presented and the effect of transferring the repeaters to upper Si layers has been quantified in this analysis. Various technologies being investigated for 3-D fabrication are reviewed. Finally, implications of 3-D architecture on several circuit designs are also discussed. 1 .

Continuous scaling of VLSI circuits is reducing gate delays but rapidly increasing interconnect delays. Semiconductor Industry Association (SIA) roadmap predicts that, beyond the 130 nm technology node, performance improvement of advanced VLSI is likely to begin to saturate unless a paradigm shift from present IC architecture is introduced. This paper presents a comprehensive analytical treatment of ICs with multiple Si layers (3-D ICs). It is shown that significant improvement in performance (more than 145%) and reduction in wire-limited chip area can be achieved with 3-D ICs with vertical inter-layer interconnects (VILICs). This analysis is based on dividing a chip into separate blocks, each occupying a separate physical level. A scheme to optimize interconnect distribution among different interconnect tiers is presented and the effect of transferring the repeaters to upper Si layers has been quantified in this analysis. Furthermore, thermal analysis of ICs with two Si layers is pres...

D technology promises higher integration density and lower interconnection complexity and delay. At present, however, not much work on circuit applications has been done due to lack of insight into 3-D circuit architecture and performance. One of the purposes of realizing 3-D integration is to reduce the interconnect complexity and delay of 2-D, which are widely avowed as the barriers to the continued performance gain in the future technology generations. Therefore, in this paper, we present a stochastic 3-D interconnect model, study the impact of 3-D integration on circuit performance and power consumption. We show that 3-D structures effectively reduce the number of long delay nets, significantly reduce the number of repeaters, and dramatically improve the circuit performance. With 3-D integration, circuits can be clocked at frequencies much higher (double, even triple) than with 2-D. However, we also show that the impacts of vertical wires on chip area and interconnect delay can be limiting factors on the vertical integration of device layers; and that 3-D integration offers limited relief of power consumption. I.

this paper will address the limits that on-chip interconnects place on a GSI system design in the 21st century

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