This paper provides an overview of research developments toward nanometer-scale electronic switching devices for use in building ultra-densely integrated electronic computers. Specifically, two classes of alternatives to the field-effect transistor are considered: 1) quantum-effect and single-electron solid-state devices and 2) molecular electronic devices. A taxonomy of devices in each class is provided, operational principles are described and compared for the various types of devices, and the literature about each is surveyed. This information is presented in nonmathematical terms intended for a general, technically interested readership

An early historical overview is first presented here on the use of simulation in optical microlithography, along with a description of the general physical models. This paper then turns to more recent development work in microlithography simulation, which has followed several very different tracts. Three of the most important areas are discussed here. The first involves improvements in the underlying physical models, such as advances beyond the Kirchhoff boundary condition in optical diffraction theory, as well as a deeper understanding into the chemistry and physical behavior of photoresist materials. Such work guides basic understanding both in the optics and photoresist areas. At the other extreme, phenomenological models are being advanced to enable simulation results on large scales to be placed in the hands of device and circuit designers. Finally, optimization of the large number of allowable parameters is a pervasive problem that has received much attention and interest by the engineering community. Keywords—Lithography, microelectronics, microlithography, optics, simulation. I.

Abstract — We discuss the design, fabrication and testing of a hybrid microsystem for stand-alone cell culture and incubation. The micro-incubator is engineered through the integration of a silicon CMOS die for the heater and temperature sensor, with multilayer silicone (PDMS) structures namely, fluidic channels and a 1.5mm diameter, 12µL culture well. A 90 micron thick PDMS membrane covers the top of the culture well, acting as barrier to contaminants while at the same time allowing the cells to breath and exchange gases with the ambient environment. The packaging for the microsystem includes a flexible polyimide electronic ribbon cable and four fluidic ports that provide external interfaces to electrical energy, closed-loop sensing and electronic control as well as solid and liquid supplies. The complete structure has a size of (2.5×2.5×0.6) cm 3. We have employed the device to successfully culture BHK-21 cells autonomously over a three day period in ambient environment.

page 1 The ability to instantly communicate and exchange information with anyone at anytime, anywhere in the world, i.e., the Internet, has eliminated distances that once kept people apart. Here, we focus on the course "Fundamentals and Design of Microelectronics Processing, " which was offered for the first time on the Web in Spring 2000. In fact, this is the first course ever to be offered on the Web from the Chemical Engineering Department at UIC; to our knowledge, this is also the first chemical engineering (ChE) microelectronics course ever to be offered on the Web. Through this web-based dual-level ChE course, we present and discuss our experiences on the impact the Internet is having in the field of engineering education. We also examine the Internet’s potential benefits to learning and what it means to teach a graduate/advanced undergraduate engineering course on the Web. The Dual Level Graduate/Undergraduate Course Increasingly more chemical engineers are entering the field of microelectronic materials and processing, in part because basic knowledge of this fast growing field lies in chemical engineering. Novel ultra-thin dielectric materials, passivation of silicon and silicon germanium, surface and gas phase reaction chemistry in microfabrication techniques, diffusion of impurities through the films, and process-structure-function relationships in micro- and nano-electronics processing are some representative example-systems [1-11]. Chemical, electrical and material engineering principles in the fundamental understanding and design of microelectronics page 2 processing are bringing about great changes in integrated circuits, micro-electro-mechanical systems (MEMS), and other fields in which data acquisition, computation, or controls are necessary. Several chemical engineering departments (worldwide) have been either offering courses in microelectronic materials and processing or incorporating several examples and case studies in core curriculum chemical engineering courses (e.g., [12-14]).

In DUV photolithography, mask patterns and processes are increasing in complexity, while IC critical dimensions continue to shrink at a rapid pace. As a result, the proportional variability of the gate CD will increase to unacceptable levels unless a more sophisticated means of advanced process control is introduced. The proposed process control framework exploits scatterometry, which provides rapid, in-line, full-profile metrology. The major obstacle to implementing scatterometry in a process control setting is profile inversion—deriving estimated input conditions from the measured profile. In this work, profile inversion is accomplished by extending standard library-based scatterometry to include a first principlebased simulator (PROLITH). This lithography process simulator is used to create a collection of inputconditions-to-profile pairs; in turn, these profiles are used to generate simulated diffraction responses, resulting in a library that links the simulated diffraction response to the corresponding process input conditions. Finally, the empirically measured diffraction response is matched to a simulated diffraction response in this library, allowing for estimation of actual process conditions. Preliminary, simulation-only results suggest that the framework has the potential to be successful even with limited library size, particularly if approximate values of some input conditions are provided by independent sensors.

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Development of hybrid MEMS devices has demonstrated a need for automatic microassembly strategies. Visual servoing techniques have shown great promise as a control strategy capable of sub-micron precision while compensating for many of the problems that exist in the micro domain, including thermal expansion of assembly devices and imprecisely modeled and calibrated sensors and actuators. This project develops rules for micropart design to aid in device assemblability with visual servoing techniques by ensuring that the microparts can be easily tracked and controlled using vision feedback. A criterion is presented that estimates part trackability based on the visual appearance of the part. This criterion is then used to microfabricate features to improve part trackability and hence, the assemblability of the device. The criterion considers the feature appearance when the part lies out of the optical system's depth-of-field. A Fourier optics based approach is used to simulate the visual appearance of microparts represented by CAD models using high resolution optical systems. This simulation is used to automatically design microfabricated features on microparts. These features are used to estimate the tracking accuracy of the MEMS parts to subpixel levels using interpolation techniques in optical flow based tracking. This allows MEMS parts to be assembled with precisions on the order of 20 nm with high magnification lens, using visual servoing strategies. The curvature of the SSD surface is used to predict the tracking accuracy of the feature designed irrespective of defocus level and settings of the lens. Results demonstrating the capabilities of design-for-microassembly rules using visual servoing microassembly strategies are presented.

ii ACKNOWLEDGEMENTS Piranha has a very distinctive smell. I’m guessing that whenever I am unlucky enough to smell this obnoxious odor in the future, I will be reminded of life under yellow light in a bunny suit. However, I don’t think my mind will dwell for long on memories of late nights in the cleanroom or lengthy finite element computations. Instead, I’m sure my thoughts will quickly turn to the faces and voices of the people who populated the cleanroom, the graduate student offices, and the laboratories in Ann Arbor. Because people, of course, are what make an experience worth remembering. First, let me thank my family; the foundation on which everything else has been built. The most important year of any PhD is the middle year because that’s the year you get married. So, Jane, thanks so much for your love, support, and friendship. I also want to thank my parents and sister for all their support and love, and my parents-in-law and sister-in-law for their support and love. I am very grateful to Prof. Grosh for his direction, advice, and guidance over the course of the degree. He has always made time to help me with any difficulties I encountered, and has made it as smooth as possible to progress through the various stages of the degree. I appreciate his creativity, clear thinking, and good humor. I am also thankful for the help

Thin film technology for chemical sensors

Abstract not found