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c © 2014 Yuelin Du OPTIMIZATION FOR ADVANCED LITHOGRAPHY BY
"... Lithography has always been the most critical process in integrated circuit (IC) fabrication. Below the 28 nm technology node, conventional 193 nm im-mersion lithography (193i) with single exposure has reached its printability limit. In order to keep up with Moore’s law, a lot of advanced lithograph ..."
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lithography and process techniques have been coming up in the recent decade, such as fin based multiple-gate field-effect (FinFET) transistors, electron beam lithog-raphy (EBL), self-aligned double patterning (SADP) lithography, directed self-assembly (DSA), extreme ultraviolet lithography (EUVL), etc. Each
Design and Analysis of Fast Low Power SRAMs
, 1999
"... This thesis explores the design and analysis of Static Random Access Memories (SRAMs), focusing on optimizing delay and power. The SRAM access path is split into two portions: from address input to word line rise (the row decoder) and from word line rise to data output (the read data path). Techniqu ..."
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Cited by 10 (0 self)
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This thesis explores the design and analysis of Static Random Access Memories (SRAMs), focusing on optimizing delay and power. The SRAM access path is split into two portions: from address input to word line rise (the row decoder) and from word line rise to data output (the read data path
A year in the life of immersion lithography at Albany
"... 193nm immersion lithography has become a primary contender for the technology of choice for next generation lithography, with many technologists predicting it will be capable of taking the semiconductor industry to the 45nm, or even the 32nm manufacturing nodes. 2005 saw considerable breakthroughs, ..."
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193nm immersion lithography has become a primary contender for the technology of choice for next generation lithography, with many technologists predicting it will be capable of taking the semiconductor industry to the 45nm, or even the 32nm manufacturing nodes. 2005 saw considerable breakthroughs
Design and Analysis of SRAM’s for Energy Harvesting Systems
, 2014
"... At present, the battery is employed as a power source for wide varieties of microelectronic systems ranging from biomedical implants and sensor net-works to portable devices. However, the battery has several limitations and incurs many challenges for the majority of these systems. For instance, the ..."
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At present, the battery is employed as a power source for wide varieties of microelectronic systems ranging from biomedical implants and sensor net-works to portable devices. However, the battery has several limitations and incurs many challenges for the majority of these systems. For instance
Maskless Lithography Systems
"... Copyright c ⃝ 2010 by Hsin-I Liu1 Architecture and Hardware Design of Lossless Compression Algorithms for Direct-Write ..."
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Copyright c ⃝ 2010 by Hsin-I Liu1 Architecture and Hardware Design of Lossless Compression Algorithms for Direct-Write
process variability in ultra-deep-submicron SRAMs
, 2015
"... methodologies for modelling the impact of ..."
Assessing Chip-Level Impact of Double Patterning Lithography
"... Abstract—Double patterning lithography (DPL) provides an attractive alternative or a supplementary method to enable the 32nm and 22nm process nodes, relative to costlier technology options such as high refractive index materials, extreme ultraviolet (EUV), or e-beam lithography. DPL implements patte ..."
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Abstract—Double patterning lithography (DPL) provides an attractive alternative or a supplementary method to enable the 32nm and 22nm process nodes, relative to costlier technology options such as high refractive index materials, extreme ultraviolet (EUV), or e-beam lithography. DPL implements
Metrology Supporting Extreme Ultraviolet Lithography........................
, 2007
"... On the cover (top to bottom): Joseph Hodges operating frequency-stabilized cavity ring-down spectroscopy (CRDS) for measuring very low concentration contaminants in process gases. Time-resolved vertical distribution of optical emission at 750 nm from a dual-frequency capacitively-coupled plasma. Cri ..."
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On the cover (top to bottom): Joseph Hodges operating frequency-stabilized cavity ring-down spectroscopy (CRDS) for measuring very low concentration contaminants in process gases. Time-resolved vertical distribution of optical emission at 750 nm from a dual-frequency capacitively-coupled plasma
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