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Optimal Phase Conflict Removal for Layout of Dark Field Alternating Phase Shifting Masks
by Piotr Berman, Andrew B. Kahng, Devendra Vidhani, Huijuan Wang, Alexander Zelikovsky — 1999 — PROC. ACM/IEEE INTL. SYMP. ON PHYSICAL DESIGN
…Optimal Phase Con ict Removal for Layout of Dark Field Alternating Phase Shifting Masks Piotr…
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